atmospheric pressure chemical vapour deposition (APCVD)

Atmospheric PressureCVD (APCVD) is a coating process, Chemical Vapour Deposition ( CVD), which is used to produce doped and undoped oxides and works with atmospheric pressure. In the APCVD process, silicon-based gases and oxygen react to form silicon dioxide ( SiO2), which is deposited as a layer on the wafer.